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GaAs-based near-infrared up-conversion device fabricated by wafer fusion

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7 Author(s)
Yang, Y. ; Dept. of Phys., Shanghai Jiao Tong Univ., Shanghai, China ; Liu, H.C. ; Shen, W.Z. ; Gupta, J.A.
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Reported for the first time is a full GaAs-based room-temperature near infrared (NIR) up-conversion device fabricated by wafer-fusing a GaNAsSb/GaAs pin photodetector (PD) with a GaAs/AlGaAs light emitting diode (LED). NIR photons with wavelengths in the range 1.3-1.6 μm were up-converted to 0.87 μm.

Published in:
Electronics Letters  (Volume:47 ,  Issue: 6 )

Date of Publication: March 17 2011

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