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Defect reduction in advanced lithography processes using a new dual functionality filter

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2 Author(s)
Wu, Aiwen ; Entegris Inc., 129 Concord Road, Billerica, MA 01821, USA ; Chow, Wailup

Lower defect densities are required for advanced lithography processes. A new photochemical filtration technology using a nonsieving membrane on the upstream side and a sieving membrane on the downstream side of the filter will be shown to effectively reduce bridging defects on the wafer. This “dual-capture” mechanism provides high gel particle retention in photolithography applications.

Published in:

Semiconductor Manufacturing (ISSM), 2008 International Symposium on

Date of Conference:

27-29 Oct. 2008