By Topic

Method and system for determining optimal wafer sampling in real-time inline monitoring and experimental design

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Susan Sun ; Micron Technology Inc, Manassas, VA 20110, USA ; Kari Johnson

This paper describes a method and system based on weighted objectives to determine optimal wafer sampling for maximum coverage of the various process scenarios combined with coverage of each treatment of a designed experiment. It also uses a scalable technique to ensure global optimization instead of local optimization.

Published in:

Semiconductor Manufacturing (ISSM), 2008 International Symposium on

Date of Conference:

27-29 Oct. 2008