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UV-embossing process is a potential method for replicating micro optical element with continuous relief structure. Acrylate-based UV-induced polymer was traditional used, and there exists much limitation. In this paper, a novel thiol-ene was used in UV-embossing process as resist. And it can be shown in experiment that micro structure can be precisely replicated, and fabrication error is less than 3%. Meanwhile, the resistance of this material is well. Micro structure of MOE can be transferred into fused silica equally through reactive ion etching process. After etching process, the error is less than 5%. So it can be seen that the process is a proper method for fabrication of micro optical element.