By Topic

GaN-Based Super Heterojunction Field Effect Transistors Using the Polarization Junction Concept

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Akira Nakajima ; Department of Electronic and Electrical Engineering, University of Sheffield, Sheffield, U.K. ; Yasunobu Sumida ; Mahesh H. Dhyani ; Hiroji Kawai
more authors

GaN super heterojunction field effect transistors (super HFET) based on the polarization junction concept are demonstrated for the first time. The super HFET has charges of 2-D electron gas and hole gas, respectively induced by positive and negative polarization charges at GaN/AlGaN/GaN heterointerfaces. Analogous to the RESURF concept, these unintentionally doped positive and negative polarization charges compensate each other in the off state condition to enhance the breakdown capability of the super HFET. The super HFETs have been fabricated on sapphire substrates and the electrical measurements show breakdown voltages over 1.1 kV with specific on-resistance of 6.1 mΩ· cm^2.

Published in:

IEEE Electron Device Letters  (Volume:32 ,  Issue: 4 )