By Topic

A silicon-based technology for the fabrication of smooth optical devices

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Teo, E.J. ; Inst. of Mater. Res. & Eng., Singapore, Singapore ; Xiong, B.Q. ; Breese, M.B.H. ; Bettiol, A.A.

In this paper, we report a novel fabrication technique for integrated silicon waveguides and devices. Unlike conventional silicon-on-insulator (SOI) technology, this process uses proton beam writing and electrochemical etching in hydrofluoric acid to fabricate strip waveguides directly in silicon, eliminating the need for SOI substrate. We characterized and simulated the propagation loss and surface roughness scattering of these waveguides. A surface smoothening technique based on controlled oxidation has also been used to achieve a root-mean-square roughness of better than 3 nm, pushing the propagation loss down to 1dB/cm.

Published in:

Photonics Global Conference (PGC), 2010

Date of Conference:

14-16 Dec. 2010