Cart (Loading....) | Create Account
Close category search window
 

Experimental demonstration of aperiodic patterns of directed self-assembly by block copolymer lithography for random logic circuit layout

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Li-Wen Chang ; Center for Integrated Syst., Stanford Univ., Stanford, CA, USA ; Xinyu Bao ; Bencher, C. ; Wong, H.-S.P.

We have experimentally demonstrated block copolymer lithography in conjunction with optical lithography features on dimensional scales close to the natural pitch of the self-assembling block copolymer. Within this context, the inherent self-assembled shape, size and arrangement will self-adjust to accommodate the external confinement. This added flexibility of directed self-assembly of aperiodic patterns can potentially be used for patterning contact holes for random logic circuit layout.

Published in:

Electron Devices Meeting (IEDM), 2010 IEEE International

Date of Conference:

6-8 Dec. 2010

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.