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Experimental demonstration of aperiodic patterns of directed self-assembly by block copolymer lithography for random logic circuit layout

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4 Author(s)
Li-Wen Chang ; Center for Integrated Syst., Stanford Univ., Stanford, CA, USA ; Xinyu Bao ; Bencher, C. ; Wong, H.-S.P.

We have experimentally demonstrated block copolymer lithography in conjunction with optical lithography features on dimensional scales close to the natural pitch of the self-assembling block copolymer. Within this context, the inherent self-assembled shape, size and arrangement will self-adjust to accommodate the external confinement. This added flexibility of directed self-assembly of aperiodic patterns can potentially be used for patterning contact holes for random logic circuit layout.

Published in:

Electron Devices Meeting (IEDM), 2010 IEEE International

Date of Conference:

6-8 Dec. 2010