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Diode-less nano-scale ZrOx/HfOx RRAM device with excellent switching uniformity and reliability for high-density cross-point memory applications

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11 Author(s)
Joonmyoung Lee ; Sch. of Mater. Sci. & Eng., Gwangju Inst. of Sci. & Technol., Gwangju, South Korea ; Jungho Shin ; Daeseok Lee ; Wootae Lee
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We report excellent switching uniformity and reliability of RRAM device with ZrOx/HfOx bi-layer films. Precise control of the oxygen vacancy concentration in HfO2 layer was achieved by depositing thin Zr metal (2-15nm) layer. Scaling down active device area (φ=50 nm) and film thickness (<;2-5 nm) can significantly minimize the extrinsic defects-related non-uniform switching which was normally observed in large area (φ >;um) device, with higher active layer thickness (>;10 nm). Using back-to-back connection of two RRAM devices, we confirmed feasibility of a diode-free cross-point array with a wide readout margin and stable data reading. Considering excellent electrical and reliability characteristics of diode-free RRAM device, shows a great promise for future high density cross-point memory devices.

Published in:

Electron Devices Meeting (IEDM), 2010 IEEE International

Date of Conference:

6-8 Dec. 2010