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Nanoelectromechanical Memory Cell (T Cell) for Low-Cost Embedded Nonvolatile Memory Applications

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2 Author(s)
Lee, Kwangseok ; Dept. of Electron. Eng., Sogang Univ., Seoul, South Korea ; Woo Young Choi

A novel nanoelectromechanical memory cell (T cell) design has been proposed and successfully demonstrated by simulation and experimental results of its prototype cell. The T-cell structure has a simpler fabrication process than the previously reported H cell because the T cell needs only two metal line layers. The T cell can be used for low-cost embedded nonvolatile memory applications.

Published in:

Electron Devices, IEEE Transactions on  (Volume:58 ,  Issue: 4 )

Date of Publication:

April 2011

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