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We present the fabrication and characterization of a guided-mode resonance-based high reflector operating in transverse-electric (TE) polarization. This reflector consists of a single periodic layer of amorphous silicon on a glass substrate. It is fabricated by silicon sputtering, holographic interference patterning, and dry etching. The measured reflectance exceeds 90% over a ~ 130-nm wavelength range with maximum reflectance of ~ 98% in a band centered at a ~ 1560-nm wavelength. The experimental spectrum approximates the theoretical spectral response of this fundamental minimal device.