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Nickel germanide formation via solid phase epitaxial regrowth of amorphous germanium

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5 Author(s)
Johnson, B.C. ; Sch. of Phys., Univ. of Melbourne, Parkville, VIC, Australia ; Leong, M. ; Kandasamy, S. ; Holland, A.
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The effect of Ni on the kinetics of solid phase epitaxial re-crystallization of amorphous germanium films is investigated with Raman spectroscopy. Both Ni implantation and deposition are employed.

Published in:

Optoelectronic and Microelectronic Materials and Devices (COMMAD), 2010 Conference on

Date of Conference:

12-15 Dec. 2010