Close category search window
 

Thermal and shock induced modification inside a silica glass by focused femtosecond laser pulse

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

5 Author(s)
Sakakura, M. ; Kyoto University Office of Society-Academia Collaboration for Innovation, Kyoto 615-8520, Japan ; Terazima, M. ; Shimotsuma, Y. ; Miura, K.
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.3533431 

The femtosecond laser induced structural modification was studied by the detection of a laser induced pressure wave using a transient lens (TrL) method. The TrL signals observed at various excitation pulse energies showed that there were two thresholds of the pulse energy for the modification. Above the higher threshold, a pressure wave was observed clearly, and the amplitude of the pressure wave increased with increasing excitation pulse energy. In addition, Raman spectra at the laser irradiated region showed that the compact silica ring structures increased in the photoexcited region above the higher threshold, which suggested that the photoexcited glass was densified by a shock due to a pressure wave generation. In the energy region between the lower and higher thresholds, a pressure wave was not detected but a temporally constant refractive index change was observed. From the amplitude of the change, the temperature elevation just after the photoexcitation in this energy region was estimated to be about 1400 K. We interpreted that fast cooling from the high temperature is responsible for the modification between the lower and higher thresholds. The two modifications identified in this study should correspond to two types of damage inside a silica glass which have been observed previously. This is the first study that elucidated the difference of two types of modification from the time-resolved observation of the dynamics.

Published in:
Journal of Applied Physics  (Volume:109 ,  Issue: 2 )

Date of Publication: Jan 2011

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.