By Topic

Topology optimized low-contrast all-dielectric optical cloak

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

2 Author(s)
Andkjær, Jacob ; Department of Mechanical Engineering, Technical University of Denmark, 2800 Kgs. Lyngby, Denmark ; Sigmund, Ole

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.3540687 

A systematic methodology for designing low-contrast all-dielectric cloaks operating in the optical range is presented. Topology optimization is used to find the layout of standard dielectric material that minimizes the norm of the scattered field in the surroundings of the cloak. Rotational symmetries are exploited to optimize for multiple angles based on the solution for a single angle of incidence. For a few discrete angles of incidences (1–4) the cloaking is shown to be nearly perfect in a limited frequency range, and even for a rotational symmetric design, cloak and object appear smaller than the noncloaked object.

Published in:

Applied Physics Letters  (Volume:98 ,  Issue: 2 )