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Novel periodic microstructures fabricated by multi-exposure two-beam interference lithography

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2 Author(s)
Yinbing Bai ; Centre for Optical and Electromagnetic Research, State Key Laboratory of Modern Optical Instrumentation, Zhejiang University, Hangzhou 310058, China ; A. Ping Zhang

Some novel periodic structures with different internal nanopatterns are numerically and experimentally demonstrated based on multi-exposure two-beam interference lithography. Two-dimensional quasi-crystal structures were fabricated with precisely controlled exposure directions and doses. The experiment results show such a fabrication technology is very promising for making diverse large-area submicron structures.

Published in:

Asia Communications and Photonics Conference and Exhibition

Date of Conference:

8-12 Dec. 2010