X-ray imaging test for a single-stage MEMS X-ray optical system

An X-ray imaging test for an X-ray optical system based on MEMS technologies was conducted at the ISAS 30 m beamline. An X-ray reflection and focusing were successfully verified at Al K
α
1.49 keV for the first time. The image quality estimated as a half power diameter was ∼20 arcmin. This was consistent with the angular resolution estimated from the surface roughness of 200 nm rms at 100 μm scale. In this paper, the experimental setup and the result of X-ray imaging analysis are reported.