Referenced Items are not available for this document.
Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.3507888
The authors have applied spectroscopic ellipsometry optical critical dimension (SE-OCD) measurement to grating templates and imprinted resist patterns with a pitch of 72.6 nm, corresponding to a track density of 350 ktpi (kilotracks per inch) for discreet track recording media. Their experiments indicate that SE-OCD is sensitive in detecting topography features in template profiles. The measurement of imprinted resist pattern is complicated by parameter correlation. Comparison of SE-OCD reported template and imprinted resist profiles can be used to study imprint pattern fidelity.
Published in:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
(Volume:28
,
Issue:
6
)
Date of Publication: Nov 2010
- Page(s):
- C6M130 - C6M135
- ISSN :
- 1071-1023
- Digital Object Identifier :
- 10.1116/1.3507888
- Product Type:
- Journals & Magazines
- Date of Current Version :
- 06 December 2010
- Issue Date :
- Nov 2010
About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies
A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.
