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High accuracy UV-nanoimprint lithography step-and-repeat master stamp fabrication for wafer level camera application

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5 Author(s)
Kreindl, G. ; EVGroup, DI Erich Thallner Strasse 1, 4782 St. Florian, Austria ; Glinsner, T. ; Miller, R. ; Treiblmayr, D.
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Herein, the authors demonstrate the use of step-and-repeat nanoimprint lithography for the fabrication of wafer level lens master. Thereby, the authors will focus on so far unmet needs in regard to lateral lens to lens positioning, residual layer uniformities, as well as optic axis tilt control to enable the fabrication of high-end megapixel camera modules.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:28 ,  Issue: 6 )