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Intense pulsed field emission of carbon nanotube film grown on electroless plated Ni substrate

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4 Author(s)
Zeng Fan-Guang ; Dept. of Math. & Phys., Zhengzhou Inst. of Aeronaut. Ind. Manage., Zhengzhou, China ; Xin Li ; Liansheng Xia ; Zhang Rui

In this paper, intense pulsed field emission of carbon nanotube film grown on electroless plated Ni substrate is presented. Ni substrate used for CNT film growth was prepared on Si wafer (2 inches diameter) by using electroless plating process in plating solution composed of nickel sulfate and assistant. Palladium catalyst was used for Ni plating. CNT film was synthesized by the pyrolysis of FePc.

Published in:
Vacuum Electron Sources Conference and Nanocarbon (IVESC), 2010 8th International

Date of Conference: 14-16 Oct. 2010

Page(s):
548 - 549
Print ISBN:
978-1-4244-6645-0
INSPEC Accession Number:
11677574
Conference Location :
Nanjing
Digital Object Identifier :
10.1109/IVESC.2010.5644201
Product Type:
Conference Publications

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