Intense pulsed field emission of carbon nanotube film grown on electroless plated Ni substrate

In this paper, intense pulsed field emission of carbon nanotube film grown on electroless plated Ni substrate is presented. Ni substrate used for CNT film growth was prepared on Si wafer (2 inches diameter) by using electroless plating process in plating solution composed of nickel sulfate and assistant. Palladium catalyst was used for Ni plating. CNT film was synthesized by the pyrolysis of FePc.