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High-efficiency silicon solar cells by low-cost rapid thermal processing, screen printing, and plasma-enhanced chemical vapor deposition

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7 Author(s)
Doshi, P. ; Univ. Center of Excellence for Photovoltaics Res. & Educ., Georgia Inst. of Technol., Atlanta, GA, USA ; Mejia, J. ; Tate, K. ; Kamra, S.
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This paper presents, for the first time, the successful integration of three rapid, low-cost, high-throughput techniques for crystalline Si cell fabrication, namely: rapid thermal processing (RTP) for simultaneous diffusion of a phosphorus emitter and aluminum back-surface-field; screen-printing (SP) for the front grid contact; and low-temperature PECVD of SiN for antireflection and surface passivation. This combination has resulted in 4 cm2 cells with efficiencies of 16.3% and 15.9% on 2 Ω-cm FZ and Cz, respectively, as well as 15.4% efficient, 25 cm2 FZ cells. Despite the respectable RTP/SP efficiencies, cells formed by conventional furnace processing and photolithography (CFP/PL) give ~2% (abs.) greater efficiencies. Through in-depth modeling and characterization, this difference is quantified on the basis of emitter design, grid shading, and quality of contacts

Published in:

Photovoltaic Specialists Conference, 1996., Conference Record of the Twenty Fifth IEEE

Date of Conference:

13-17 May 1996