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A compact SR beamline for fabrication of high aspect ratio MEMS microparts

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7 Author(s)
Sugiyama, S. ; Dept. of Mech. Eng., Ritsumeikan Univ., Kyoto, Japan ; Zhang, Y. ; Ueno, H. ; Hosaka, M.
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Taking advantage of the small synchrotron radiation (SR) equipment “AURORA” at Ritsumeikan University, we developed a compact beamline, which has a distance of about 3 meters between the SR source and exposure stages, to carry out deep X-ray lithography for fabrication of high aspect ratio MEMS microparts. Since the beamline is compact, a relatively high photon density can be achieved with the very small SR equipment so 1000 μm-high microstructures with an aspect ratio of 10 in an area of 15 mm×30 mm of the PMMA resist could be produced with 160 minutes exposure, 200 μm-high microstructures with an aspect ratio 10 were fabricated in a PMMA resist sheet and then used as a template for nickel electroforming, in order to further fabricate the high aspect ratio MEMS microparts in other materials, a large-area (4-inch) exposure can also be carried out by scanning X-Y stages controlled by a personal computer

Published in:

Micro Machine and Human Science, 1996., Proceedings of the Seventh International Symposium

Date of Conference:

2-4 Oct 1996