Cart (Loading....) | Create Account
Close category search window

Investigation of surface properties on Indium Thin Oxide films modified by MirroTron Sputtering system

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

7 Author(s)
Mungkung, N. ; Dept. of Electr. Technol. Educ., King Mongkut''s Univ. of Technol. Thonburi, Bangkok, Thailand ; Yuji, T. ; Nakabayashi, K. ; Kataoka, H.
more authors

Indium Tin Oxide (ITO) film is evaporated on the PEN film using MirrorTron Sputtering system, which is a new sputtering system enabling sputter deposition at a low temperature, separating a sputtering chamber and a deposition chamber. As a result, a uniform ITO thin-film deposition with a film thickness of 150 nm is enabled. This ITO thin-film is chemically analyzed using Focused ion beam and X-ray photoelectron spectroscopy. As a result, good thin-film condition is confirmed.

Published in:

Discharges and Electrical Insulation in Vacuum (ISDEIV), 2010 24th International Symposium on

Date of Conference:

Aug. 30 2010-Sept. 3 2010

Need Help?

IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.