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Indium Tin Oxide (ITO) film is evaporated on the PEN film using MirrorTron Sputtering system, which is a new sputtering system enabling sputter deposition at a low temperature, separating a sputtering chamber and a deposition chamber. As a result, a uniform ITO thin-film deposition with a film thickness of 150 nm is enabled. This ITO thin-film is chemically analyzed using Focused ion beam and X-ray photoelectron spectroscopy. As a result, good thin-film condition is confirmed.