Referenced Items are not available for this document.
Indium Tin Oxide (ITO) film is evaporated on the PEN film using MirrorTron Sputtering system, which is a new sputtering system enabling sputter deposition at a low temperature, separating a sputtering chamber and a deposition chamber. As a result, a uniform ITO thin-film deposition with a film thickness of 150 nm is enabled. This ITO thin-film is chemically analyzed using Focused ion beam and X-ray photoelectron spectroscopy. As a result, good thin-film condition is confirmed.
Published in:
Discharges and Electrical Insulation in Vacuum (ISDEIV), 2010 24th International Symposium on
Date of Conference: Aug. 30 2010-Sept. 3 2010
- Page(s):
- 509 - 512
- ISSN :
- 1093-2941
- E-ISBN :
- 978-1-4244-8366-2
- Print ISBN:
- 978-1-4244-8367-9
- INSPEC Accession Number:
- 11638806
- Conference Location :
- Braunschweig
- Digital Object Identifier :
- 10.1109/DEIV.2010.5625759
- Product Type:
- Conference Publications
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