Referenced Items are not available for this document.
We present a fully reconfigurable optical filter built by cascading four identical unit cells. The devices are fabricated using two distinct methods: a complementary metal-oxide-semiconductor (CMOS) compatible process utilizes deep ultraviolet (DUV) lithography with tuning elements defined by ion implantation to make lateral p-i-n diodes for current injection regions, while an electron beam (E-beam) lithography process uses nickel chrome (NiCr) heaters as tuning elements. The fabricated devices are characterized using swept optical vector network analyzer (OVNA) coherent measurements.
Published in:
Photonics Technology Letters, IEEE
(Volume:23
,
Issue:
1
)
Date of Publication: Jan.1, 2011
- Page(s):
- 42 - 44
- ISSN :
- 1041-1135
- INSPEC Accession Number:
- 11704362
- Digital Object Identifier :
- 10.1109/LPT.2010.2090868
- Product Type:
- Journals & Magazines
- Date of Publication :
- 09 November 2010
- Date of Current Version :
- 20 December 2010
- Issue Date :
- Jan.1, 2011
- Sponsored by :
- IEEE Photonics Society
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