By Topic

Nanolocalization of features in the patterns produced by Four-beam Laser Interference Lithography

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

4 Author(s)
Guowei Xiu ; Centre for Nano Metrol. & Manuf. Technol., Changchun Univ. of Sci. & Technol., Changchun, China ; Zhengxun Song ; Zhen Hu ; Zhankun Weng

This paper presents a method for nanolocalization of features in the patterns produced by Four-beam Laser Interference Lithography (FBLIL) using image processing techniques. In the work, the least-squares fitting method was used for nanolocalization of features, having obtained the main parameters of the pattern by both simulation and experiment. The results have shown that the method is useful for the nanolocalization of the pattern features in laser interference lithography.

Published in:

Mechanical and Electrical Technology (ICMET), 2010 2nd International Conference on

Date of Conference:

10-12 Sept. 2010