IEEE.org| IEEE Xplore Digital Library| IEEE Standards| IEEE Spectrum| More Sites

Cart (Loading....) | Create Account | 

Close category search window
Author Searchbeta |  Advanced Search  |  Preferences |  Search Tips  |  More Search Options  
 
Browse Journals & Magazines > Plasma Science, IEEE Transact ...> Volume:38 Issue:11 Help

Special Issue on HiPIMS and High Power Glow Discharge

Full Text Sign-In or Purchase

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

The purchase and pricing options are temporarily unavailable. Please try again later.
2 Author(s)
Yukimura, K. ; National Institute of Advanced Industrial Science and Technology, Tsukuba, Japan ; Ehiasarian, A. P.

This special issue focuses on high-power impulse magnetron sputtering (HiPIMS) technology. Twelve papers are included in this special issue.

Published in:
Plasma Science, IEEE Transactions on  (Volume:38 ,  Issue: 11 )

Date of Publication: Nov. 2010

Page(s):
3005 - 3006
ISSN :
0093-3813
Digital Object Identifier :
10.1109/TPS.2010.2073131
Product Type:
Journals & Magazines
Date of Publication :
30 September 2010
Date of Current Version :
09 November 2010
Issue Date :
Nov. 2010
Sponsored by :
IEEE Nuclear and Plasma Sciences Society

IEEE Account

Purchase Details

Profile Information

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2013 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.