Cart (Loading....) | Create Account
Close category search window
 

Use of neural networks in modeling relations between exposure energy and pattern dimension in photolithography process [MOS ICs]

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Cardarelli, G. ; Fac. of Eng., L''Aquila Univ., Italy ; Palumbo, M. ; Pelagagge, P.M.

The photolithography process is one of the most complex operations in semiconductor production. Exposure energy definition is particularly critical because it strongly affects the operation results. Very complex links exist between exposure energy, pattern critical dimensions, photo resist thickness, and resistivity. At present, the wafer test experimental procedure is used in order to define suitable exposure energy. With the aim of finding a less expensive control criterion of exposure operation in the photolithography process, a neural network has been developed that is able to model the relation between exposure energy and pattern dimensions measured in different positions on the wafer. As a result, the neural network model developed has been found to perform as well as the very expensive test wafer procedure and constitutes a good alternative to this one, allowing for a remarkable cost reduction

Published in:

Components, Packaging, and Manufacturing Technology, Part C, IEEE Transactions on  (Volume:19 ,  Issue: 4 )

Date of Publication:

Oct 1996

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.