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A comparative analysis of run-to-run control algorithms in the semiconductor manufacturing industry

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7 Author(s)
Zhe Ning ; Michigan Univ., MI, USA ; J. R. Moyne ; T. Smith ; D. Boning
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A number of algorithms have been developed that are applicable to the run-to-run control of semiconductor manufacturing processes. The algorithm implementations include the linear approximation multivariate `Gradual Mode' (GM) controller, a time-based extended GM (GMt), the Optimizing Adaptive Quality Controller (OAQC), and the Knowledge-based Interactive Run-to-run Controller (KIRC). Research and experimentation in process control in the industry to-date has revealed that no single algorithm is sufficiently robust to cover the entire domain of process control for most tools. Indeed the optimal control solution is a multi-branch approach to control that provides for the complementary utilization of a number of control algorithms, with the various algorithms utilized in sub-domains in which they are `best' suited to provide control advice. Unfortunately this ideal solution cannot be realized because very little information is available on the suitable sub-domains of applicability of the various algorithms. This paper addresses this issue by providing a comparative analysis of a number of run-to-run control algorithms. Each algorithm is described so as to provide insight into its potential use in run-to-run control. A comparative study of the algorithms is then presented; comparison criteria include stability and ability to control in the face of noise and drift of linear and full-quadratic processes. Although the data presented does not represent an exhaustive comparison of the alternatives, it provides information that can be utilized to realize an effective multi-branch, multi-algorithm run-to-run control strategy

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1996. ASMC 96 Proceedings. IEEE/SEMI 1996

Date of Conference:

12-14 Nov 1996