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Introduction of chemical downstream etch technology into a mature manufacturing environment

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3 Author(s)
Hart, J.V., III ; IBM Microelectron. Div., Essex Junction, VT, USA ; Pekanik, J.J. ; Powell, G.

With current semiconductor manufacturing becoming more competitive and fast-paced, continual improvement is not only a requirement, but a necessity. One area of growth identified by SEMATECH member companies was the replacement of certain wet processes by chemical downstream etch (CDE). A tool built through a SEMATECH/Matrix Integrated Systems joint development program, called System 20, was identified by IBM as a candidate for evaluation. A joint development effort ensued with Matrix. This multifaceted program benefited IBM by adding new process capability, reducing cost of ownership and increasing environmental safety. Matrix benefited by having a mature, new product and technology in a manufacturing environment. The strategy for realizing this goal was achieved with a team which consisted of a core group with changing relationships and responsibilities. While the long term goal was better utilization of the new technology in manufacturing, short term goals changed with various phases of the program. Responsibilities and roles also changed with the evolution of those phases. Initially, System 20 was a prototype which had been characterized through a SEMATECH program. Preshipment performance was reevaluated at IBM and followed by new process development. After development, both process and tool capability were evaluated for in-line controls. The System 20 was evaluated using Ironman methodology comprised of continuous cycling improvement toward the goal of volume production in a dynamic manufacturing environment. In retrospect, the key requirement for success in this venture was the effective association of two partners that focused on commonly understood goals. This paper describes how the supplier and customer relationship was critical to both the development of System 20 and implementation of a new process technology in a mature fabricator

Published in:

Advanced Semiconductor Manufacturing Conference and Workshop, 1996. ASMC 96 Proceedings. IEEE/SEMI 1996

Date of Conference:

12-14 Nov 1996