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Subnanometer Translation of Microelectromechanical Systems Measured by Discrete Fourier Analysis of CCD Images

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4 Author(s)
Yamahata, C. ; Lab. of Microsyst., Ecole Polytech. Fed. de Lausanne, Lausanne, Switzerland ; Sarajlic, E. ; Krijnen, G.J.M. ; Gijs, M.A.M.

In-plane linear displacements of microelectromechanical systems are measured with subnanometer accuracy by observing the periodic micropatterns with a charge-coupled device camera attached to an optical microscope. The translation of the microstructure is retrieved from the video by phase-shift computation using discrete Fourier transform analysis. This approach is validated through measurements on silicon devices featuring steep-sided periodic microstructures. The results are consistent with the electrical readout of a bulk micromachined capacitive sensor, demonstrating the suitability of this technique for both calibration and sensing. Using a vibration isolation table, a standard deviation of σ = 0.13 nm could be achieved, enabling a measurement resolution of 0.5 nm (4σ) and a subpixel resolution better than 1/100 pixel.

Published in:

Microelectromechanical Systems, Journal of  (Volume:19 ,  Issue: 5 )