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In this work structural properties of TiO2 thin films doped with different amounts of Nd have been presented. Thin films were deposited on silicon substrates using high energy reactive magnetron sputtering process and for the measurements TiO2 doped with 0.84 at. % and 8.51 at. % of Nd have been selected. Diversification of the thin film surface was investigated using atomic force microscope. The results have shown that distribution of grains size the thin films was dependent on the amount of neodymium dopant. Moreover structural characterization of the thin films with use of X-Ray Diffraction method has shown that different structure of the TiO2 thin films was received with selected amount of Nd (0.84 and 8.51 at. %) and by additional annealing.