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An Extended Kalman filtering-based method of processing reflectometry data for fast in-situ etch rate measurements

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3 Author(s)
Vincent, T.L. ; Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA ; Khargonekar, P.P. ; Terry, Fred L.

In this paper a new algorithm is presented for determining etch rate from single or multiple wavelength reflectometry data. This algorithm is based on techniques from recursive nonlinear estimation theory-Extended Kalman Filtering. A major advantage of our algorithm is extremely high speed, with computation time less than 1 ms on a Pentium PC. Consequently, it can be used in real-time feedback control applications. The speed advantage also makes it a suitable candidate for full wafer (or multi-point) high-speed etch rate measurement

Published in:

Semiconductor Manufacturing, IEEE Transactions on  (Volume:10 ,  Issue: 1 )

Date of Publication:

Feb 1997

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