We report monolithic n-type conductivity on low-temperature (<570 °C) grown ultrananocrystalline diamond (UNCD) films by Li-diffusion (about 255 nm) from LiNbO3 substrates. Low resistivity of 1.2 Ω cm with carrier concentration of -2×1020 cm-3 is obtained on freestanding UNCD films. The films bonded to Cu-tape show very low turn-on field of 4.2 V/μm with emission current density of above 0.3 mA/cm2 at a low applied filed of 10 V/μm. The n-type conductivity of low-temperature Li-diffused UNCD films overwhelms that of the high-temperature (≥800 °C) nitrogen doped ones and will make a significant impact to diamond-based electronics.
Published in:
Applied Physics Letters
(Volume:97
,
Issue:
4
)
Date of Publication:
Jul 2010
- Page(s):
-
042107
-
042107-3
- ISSN :
-
0003-6951
- Digital Object Identifier :
-
10.1063/1.3472204
- Product Type:
-
Journals & Magazines
- Date of Current Version :
-
03 August 2010
- Issue Date :
-
Jul 2010