By Topic

Comparison of structural and photoluminescence properties of zinc oxide nanostructures influenced by gas ratio and substrate bias during radio frequency sputtering

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $31
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

9 Author(s)
Chaoyang Li ; Research Institute for Nano-device, Kochi University of Technology, Kami, Kochi 782-8502, Japan ; Matsuda, Tokiyoshi ; Kawaharamura, T. ; Furuta, Hiroshi
more authors

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.3271250 

Zinc oxide (ZnO) nanostructured films were prepared on quartz glasses by radio frequency magnetron sputtering deposition of ZnO films at different argon to oxygen (Ar/O2) gas ratios and post-treated in a reducing ambient at a low temperature. The effects of Ar/O2 gas ratio and substrate bias on the photoluminescence and structural properties were investigated. It was found that the formed ZnO nanostructures significantly depended on the O2 fraction. The crystallinities of the ZnO nanostructures were improved, and the green emission was enhanced with the decrease of the O2 fraction in the Ar/O2 mixtures. A green emission peak centered at 510 nm was obtained after the post-treatment. In addition, the applied substrate bias contributed to remarkably improving the crystallinity of the ZnO films. The strongest green emission was obtained from the ZnO nanostructures prepared from the ZnO film deposited in a pure Ar ambient with the substrate bias applied.

Published in:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures  (Volume:28 ,  Issue: 2 )