By Topic

Nanocrystalline Piezoresistive Polysilicon Film by Aluminum-Induced Crystallization for Pressure-Sensing Applications

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$33 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

3 Author(s)
Suraj Kumar Patil ; Materials Science and Engineering Department and with The Nanotechnology Research and Teaching Facility, University of Texas at Arlington, Arlington, USA ; Zeynep Çelik-Butler ; Donald P. Butler

Nanocrystalline piezoresistive polysilicon films were obtained at low temperatures by aluminum-induced crystallization (AIC). The films exhibited granular structure with good polycrystalline properties. A piezoresistive pressure sensor was fabricated on a polyimide substrate, in a Wheatstone bridge configuration comprising two passive resistors and two active piezoresistors made of polysilicon films obtained by AIC. The resistors showed linear I-V characteristics with typical resistance values between 15 and 30 kΩ . Atomic force microscopy was used in contact mode to study the response of the pressure sensor with applied pressure in the 2-19 kPa range. For the higher range of 450 kPa-2 MPa, a load-cell with a nanopositioner was utilized. The pressure-sensor sensitivity was measured to be 41.12 and 5.02 mV/MPa, respectively, for these ranges, when the Wheatstone bridge was bias at 1 V.

Published in:

IEEE Transactions on Nanotechnology  (Volume:9 ,  Issue: 5 )