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Simulation-Based Study of MEMS X-Ray Optics for Microanalysis

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6 Author(s)
Ezoe, Y. ; Dept. of Phys., Tokyo Metropolitan Univ., Tokyo, Japan ; Mitsuishi, I. ; Takagi, U. ; Ishizu, K.
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A new type of X-ray optics system based on microelectromechanical systems technologies is proposed for microanalysis. Side walls of micro pores made by silicon dry etching or X-ray lithography are used as X-ray mirrors. Ray-tracing simulations are constructed to estimate the performance of a planar X-ray optics system made of silicon and nickel. From simulations, we conclude that, with this type of optics, a fine focus on the order of <; 10 μm is possible and the intensity gain is 1000-7000 at Al Kα 1490 eV, compared to the case without this optical system.

Published in:

Quantum Electronics, IEEE Journal of  (Volume:46 ,  Issue: 9 )

Date of Publication:

Sept. 2010

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