Cart (Loading....) | Create Account
Close category search window
 

Simulation-Based Study of MEMS X-Ray Optics for Microanalysis

Sign In

Cookies must be enabled to login.After enabling cookies , please use refresh or reload or ctrl+f5 on the browser for the login options.

Formats Non-Member Member
$31 $13
Learn how you can qualify for the best price for this item!
Become an IEEE Member or Subscribe to
IEEE Xplore for exclusive pricing!
close button

puzzle piece

IEEE membership options for an individual and IEEE Xplore subscriptions for an organization offer the most affordable access to essential journal articles, conference papers, standards, eBooks, and eLearning courses.

Learn more about:

IEEE membership

IEEE Xplore subscriptions

6 Author(s)
Ezoe, Y. ; Dept. of Phys., Tokyo Metropolitan Univ., Tokyo, Japan ; Mitsuishi, I. ; Takagi, U. ; Ishizu, K.
more authors

A new type of X-ray optics system based on microelectromechanical systems technologies is proposed for microanalysis. Side walls of micro pores made by silicon dry etching or X-ray lithography are used as X-ray mirrors. Ray-tracing simulations are constructed to estimate the performance of a planar X-ray optics system made of silicon and nickel. From simulations, we conclude that, with this type of optics, a fine focus on the order of <; 10 μm is possible and the intensity gain is 1000-7000 at Al Kα 1490 eV, compared to the case without this optical system.

Published in:

Quantum Electronics, IEEE Journal of  (Volume:46 ,  Issue: 9 )

Date of Publication:

Sept. 2010

Need Help?


IEEE Advancing Technology for Humanity About IEEE Xplore | Contact | Help | Terms of Use | Nondiscrimination Policy | Site Map | Privacy & Opting Out of Cookies

A not-for-profit organization, IEEE is the world's largest professional association for the advancement of technology.
© Copyright 2014 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.