Skip to Main Content
A new type of X-ray optics system based on microelectromechanical systems technologies is proposed for microanalysis. Side walls of micro pores made by silicon dry etching or X-ray lithography are used as X-ray mirrors. Ray-tracing simulations are constructed to estimate the performance of a planar X-ray optics system made of silicon and nickel. From simulations, we conclude that, with this type of optics, a fine focus on the order of <; 10 μm is possible and the intensity gain is 1000-7000 at Al Kα 1490 eV, compared to the case without this optical system.