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A novel high-voltage pulse power system based on a programmable logic controller (PLC) is developed for plasma immersion ion implantation (PIII). The PLC unit with strong anti-interference ability is utilized to optimize both electrical parameters and ion-implantation processes with manual or/and procedure modes. Specially designed periphery circuits are developed to realize the arbitrary adjustment of pulsing frequency and width which is impossible for conventional PLC systems. The electrical protection can also work rapidly in the case of a sudden short circuit. In the main power circuit, a tetrode hard tube is employed to switch the dc high voltage. In order to reduce the rise time of the pulse as much as possible, the potentials on the tetrode grids are optimized. A closed-loop system is also designed to ensure implantation voltage not to depend on the plasma load during the PIII processes. With the help of numerical calculation or simulation, the expected ion energy-number spectrum can be easily obtained.