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Thickness monitoring of graphene on SiC using low-energy electron diffraction

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5 Author(s)
Fisher, P.J. ; IBM T. J. Watson Research Center, Yorktown Heights, New York 10598 ; Luxmi, P.J. ; Srivastava, N. ; Nie, S.
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Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1116/1.3301621 

The formation of epitaxial graphene on SiC is monitored in situ using low-energy electron diffraction (LEED). The possibility of using LEED as an in situ thickness monitor of the graphene is examined. The ratio of primary diffraction spot intensities for graphene compared to SiC is measured for a series of samples of known graphene thickness (determined using low-energy electron microscopy). It is found that this ratio is effective for determining graphene thicknesses in the range of 1–3 ML. Effects of a distribution of graphene thicknesses on this method of thickness determination are considered.

Published in:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films  (Volume:28 ,  Issue: 4 )

Date of Publication: Jul 2010

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