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Laser produced plasma light sources for EUV lithography

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1 Author(s)
La Fontaine, B. ; Cymer Inc., San Diego, CA, USA

We present the latest results on high-power extreme-ultraviolet (EUV) light sources for lithography. This includes operation of high-power pulsed CO2 lasers, high repetition-rate Sn droplet targets, and collection of EUV light using multilayer-coated optics.

Published in:

Lasers and Electro-Optics (CLEO) and Quantum Electronics and Laser Science Conference (QELS), 2010 Conference on

Date of Conference:

16-21 May 2010