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Phase shifting microwave structure employing atomic layer deposited (ALD) and ferroelectric films on flexible substrates

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5 Author(s)
Kotha, R. ; MEMS Res. Lab., San Antonio, TX, USA ; Elam, D. ; Chabanov, A. ; Chen, C.
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In this work, phase shifting performance of atomic layer deposited (ALD) films and ferroelectric films had been measured on flexible substrates. ALD ZnO and PVDF/TrFe films were patterned on signal electrode of coplanar waveguide, and their phase shifting performance was collected with a Vector Network Analyzer (VNA) in combination with coplanar microwave probes between 1 GHz to 50GHz.

Published in:
Design Test Integration and Packaging of MEMS/MOEMS (DTIP), 2010 Symposium on

Date of Conference: 5-7 May 2010

Page(s):
232 - 236
E-ISBN :
978-2-35500-011-9
Print ISBN:
978-1-4244-6636-8
INSPEC Accession Number:
11501429
Conference Location :
Seville
Product Type:
Conference Publications

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