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Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition

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4 Author(s)
Mackus, A.J.M. ; Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands ; Mulders, J.J.L. ; van de Sanden, M.C.M. ; Kessels, W.M.M.

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An approach for direct-write fabrication of high-purity platinum nanostructures has been developed by combining nanoscale lateral patterning by electron beam induced deposition (EBID) with area-selective deposition of high quality material by atomic layer deposition (ALD). Because virtually pure, polycrystalline Pt nanostructures are obtained, the method extends the application possibilities of EBID, whereas compared to other area-selective ALD approaches, a much higher resolution is attainable; potentially down to sub-10 nm lateral dimensions.

Published in:

Journal of Applied Physics  (Volume:107 ,  Issue: 11 )

Date of Publication:

Jun 2010

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