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Micrometer-sized hollow antiresonant reflecting optical waveguides on silicon substrates have been previously demonstrated with liquid and gas-filled cores. Previous designs have nonideal geometries, with nonuniform lateral layers around the hollow core, resulting in higher loss than could potentially be achieved. A new design and fabrication process has been developed involving hollow waveguide fabrication on a self-aligned pedestal (SAP) using anisotropic plasma etching. With the SAP structure, the hollow core is surrounded by uniform layers and a terminal layer of air on three sides, resulting in air-core waveguide loss of 1.54 cm-1 at 785 nm and high fabrication yield.