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High efficiency nonuniform grating coupler by utilizing the lag effect in the dry etching process

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4 Author(s)
Yongbo Tang ; Department of Microelectronics and Applied Physics, Royal institute of Technology (Sweden), 16440 Kista, Sweden; JORCEP (Joint Research Center of Photonics of the Royal Institute of Technology (Sweden) and Zhejiang University), Zhejiang University, Hangzhou 310058, China ; Zhechao Wang ; Urban Westergren ; Lech Wosinski

Utilizing the lag effect in dry etching, a nonuniform silicon-on-insulator grating coupler is designed and fabricated. Over 80% (>-1 dB) coupling efficiency is theoretically obtained and experimental coupling efficiency of 55% is achieved for TE polarization.

Published in:

Optical Fiber Communication (OFC), collocated National Fiber Optic Engineers Conference, 2010 Conference on (OFC/NFOEC)

Date of Conference:

21-25 March 2010