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Photorefractive-Damage-Resistant Locally Er–Mg-Doped Near-Stoichiometric Ti : Mg : Er : LiNbO _{3} Strip Waveguides: A Way Towards New Devices

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3 Author(s)
Ping-Rang Hua ; Dept. of Electron. Eng., City Univ. of Hong Kong, Kowloon, China ; De-Long Zhang ; Pun, E.Y.

We report photorefractive-damage-resistant near-stoichiometric (NS) Ti : Mg : Er : LiNbO3 strip waveguides fabricated on an initially congruent, undoped Z-cut substrate in sequence by local Er-doping in air, Mg-Ti prediffusion in wet O2 atmosphere, and post vapor-transport-equilibration. These waveguides with an initial Ti-strip width of 4-7 μm are single-mode at 1.3-1.5 μm, support only transverse-magnetic mode, and have a loss of 1.4 dB/cm. The waveguides are NS, still retain LiNbO3 phase, and show stable 1531-nm small-signal enhancement under the 980-nm pump power of at least 216 mW, implying that the photorefractive effect is effectively suppressed. The waveguides would open up a way towards new devices.

Published in:

Photonics Technology Letters, IEEE  (Volume:22 ,  Issue: 13 )