We have investigated the carrier tunneling process in a quantum-dot (QD) tunnel injection structure, which employs a GaAs1-xNx quantum well (QW) as a carrier injector. The influence of the barrier thickness between the GaAs1-xNx well and InAs dot layer has been studied by temperature-dependent photoluminescence. Although the 2.5 nm barrier sample exhibits the best tunneling efficiency, a 3.0 nm thickness for the barrier is optimum to retain good optical properties. The carrier capture time from the GaAs1-xNx QW to QD ground states has been evaluated by time-resolved photoluminescence. The result indicates that efficient carrier tunneling occurs at temperatures above 150 K due to the temperature dependent nature of phonon-assisted processes.
Published in:
Applied Physics Letters
(Volume:96
,
Issue:
15
)
Date of Publication:
Apr 2010
- Page(s):
-
151104
-
151104-3
- ISSN :
-
0003-6951
- Digital Object Identifier :
-
10.1063/1.3396187
- Date of Current Version :
-
15 April 2010
- Issue Date :
-
Apr 2010