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An adaptive library-based device performance-driven optical proximity correction (OPC) framework for VLSI circuit design is presented. Conventional OPC compensates image distortion by modifying the masks such that final printed shapes resemble the drawn one. Such a mask is typically very complicated; in an earlier work, a device performance-based OPC (DPB-OPC) approach to mask design by matching the device's drive current is proposed which resulted in a simpler corrected mask. However, the iterative approach resulted in significant run-time. In this work, a library-based DPB-OPC approach is developed which makes use of standard cell libraries with pre-characterised DPB-OPC masks to reduce mask design run-time. Simulation using standard benchmark circuits demonstrated run-time reduction of up to 40 times.