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Browse Journals & Magazines > Applied Physics Letters ...> Volume:96 Issue:13 Help

Single-defect photonic crystal cavity laser fabricated by a combination of laser holography and focused ion beam lithography

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3 Author(s)
Sungmo Ahn ; Department of Physics and Astronomy and Inter-university Semiconductor Research Center, Seoul National University, Seoul 151-747, Republic of Korea ; Sihan Kim ; Heonsu Jeon

Your organization might have access to this article on the publisher's site. To check, click on this link:http://dx.doi.org/+10.1063/1.3373527 

Large-scale, high-throughput fabrication of photonic crystal (PC)-based devices was achieved by using a combination of laser holography (for background PC generation) and focused ion beam lithography (for defect formation). An array of InP-based square-lattice PC lasers with a single air-hole defect was fabricated by this combined lithography. The resultant lasers consistently exhibited two lasing modes, which were identified as quadrupole and dipole modes on the basis of their spectral and polarization properties. The high cavity Q-factor (∼2200) and low laser threshold (∼0.25 mW) indicated that the laser quality was comparable to that of the PC lasers formed by electron-beam lithography.

Published in:
Applied Physics Letters  (Volume:96 ,  Issue: 13 )

Date of Publication: Mar 2010

Page(s):
131101 - 131101-3
ISSN :
0003-6951
Digital Object Identifier :
10.1063/1.3373527
Product Type:
Journals & Magazines
Date of Current Version :
01 April 2010
Issue Date :
Mar 2010

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