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We investigated the state stability of the low-resistance state (LRS) in a resistive switching memory having a Pt/Cu:MoOx/GdOx/Pt structure. Various resistance values of LRS were accurately controlled using an external load resistor connected in series with the resistive memory device. We found that the retention time decreased with an increase in the resistance of LRS. We performed accelerating tests for resistance transition from a low- to a high-resistance state under temperatures ranging from 200??C to 250??C. A predicted resistance of LRS for a ten-year retention period at 85??C was determined based on the Arrhenius law.