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Layout Proximity Effects and Modeling Alternatives for IC Designs

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2 Author(s)

Layout-dependent variations significantly affect device modeling, model extraction, and design solutions. A novel approach is proposed in this article to seamlessly integrate physical models of lithography, strained Si, and ion implantation processes, with layout geometry for efficient model generation.

Published in:

IEEE Design & Test of Computers  (Volume:27 ,  Issue: 2 )