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Infrared focal plane array incorporating silicon IC process compatible bolometer

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13 Author(s)
Tanaka, A. ; Microelectron. Res. Labs., NEC Corp., Kanagawa, Japan ; Matsumoto, S. ; Tsukamoto, N. ; Itoh, S.
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A 128×128 element bolometer infrared image sensor using thin film titanium is proposed. The device is a monolithically integrated structure with a titanium bolometer detector located over a CMOS circuit that reads out the bolometer's signals. By employing a metallic material like titanium and refining the CMOS readout circuit, it is possible to minimize 1/f noise. It is demonstrated that the use of low 1/f noise material will help increase bias current and improve the S/N ratio. Since the fabrication process is silicon-process compatible, costs can be kept low

Published in:
Electron Devices, IEEE Transactions on  (Volume:43 ,  Issue: 11 )

Date of Publication: Nov 1996

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