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The prevention of soft magnetic material from corrosion in hard disk drive is very concern due to high magnetic moment come with high corrosion sensitivity. Photoresist that is used for read/write head fabrication is important to protect magnetic element. Good photoresist should not found porosity and low water adsorption. This investigation was methodology to classify 5 conditions of photoresist which is used in fabrication at lithography process. Potentiostat/Galvanastat is selected technique by applying external voltage for current response. The result suggested proper photoresist was wet photoresist type, AZP4999. There is no degradation after lithography process had finished. Chemical wear resistance still maintain at same level of magnitude since first step (coating) till last step (developing).
Date of Conference: 3-8 Jan. 2010