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We have investigated growth of metal-free carbon nanotubes (CNTs) on glass substrates with a microwave plasma enhanced chemical vapor deposition (MPECVD) method. An amorphous carbon (a-C) film was used as a catalyst layer to grow metal-free CNTs. The a-C films were deposited with a RF magnetron sputtering method using carbon target at room temperature on glass substrates. The CNTs were prepared using a microwave plasma-enhanced chemical vapor deposition (MPECVD) method by using methane (CH4) and hydrogen (H2) gas. We have pretreated a-C catalyst layer using H2 plasma at 700Â°C and the CNTs were grown at different temperatures (350Â°C, 450Â°C and 550Â°C) and other conditions were fixed. The growth trends of CNTs against temperature were observed by field emission scanning electron microscopy (FE-SEM).